CdS Thin Films Prepared by RF Magnetron Sputtering in Ar Atmosphere

Alex Punnoose, M. Marafi, G. Prabu, F.A. El-Akkad

physica status solidi (a) · 2000 · 15 citations · 0 references

Concepts

Abstract

CdS thin films were prepared using rf planar magnetron sputtering in Ar atmosphere. Different deposition temperatures between 150 and 250 °C and different rf powers between 30 and 130 W were used. The films had hexagonal structure with crystallites oriented in the 〈100〉 direction. The increase of deposition temperature caused an increase in the crystallite size (from 380 to 450 Å) and a decrease in the resistivity (from 3.87 to 0.95Ωcm). The increase in the rf power (from 30 to 130 W) caused a decrease in the grain size (from 480 to 320Å) and an increase in the resistivity (from 0.51 to 2.05 Ωcm) above 70 W. The average optical transmission in the visible region of the spectrum ranged between 71 and 86%. The quality of the films as window layers for solar cell applications was investigated.