Rapid thermal annealing of YBaCuO films on Si and SiO2 substrates

M. Aslam, R.E. Soltis, E. M. Logothetis, R. Ager, Mats Mikkor, W. Win, J. T. Chen, L. E. Wenger

Applied Physics Letters · 1988 · 22 citations · 8 references

Concepts

Abstract

A very rapid thermal annealing technique has been employed on sputter-deposited YBaCuO films. After an O2 anneal (with or without a N2 preanneal) at temperatures as high as 920 °C for 8–12 s, films on (100)Si and on SiO2 /Si substrates exhibited superconductivity onsets above 95 K and zero resistance in the range 40–66 K.

References

8