Publication | Closed Access
Low series resistance vertical-cavity front-surface-emitting laser diode
14
Citations
6
References
1990
Year
Optical MaterialsEngineeringLaser ApplicationsLaser MaterialOptoelectronic DevicesSurface-emitting LasersHigh-power LasersLaser ControlSemiconductor LasersFront-surface-emitting Laser DiodeLasing WavelengthDouble Ion ImplantNanophotonicsPhotonicsElectrical EngineeringLaser Processing TechnologyLaser-assisted DepositionAdvanced Laser ProcessingApplied PhysicsLaser-surface InteractionsOptoelectronics
We have fabricated a front-surface-emitting laser diode (FSELD) using a technique which relies on a double ion implant of oxygen and beryllium. The laser had a low operating voltage at the lasing threshold, a low series resistance, and a relatively small threshold current of 6 mA for a 25-μm-diam device. The lasing wavelength was 971 nm and the spectral width above threshold was 5 Å. Since the light comes from the front surface of the wafer, the fabrication technique described here for realizing a FSELD can be used for the fabrication of vertical-cavity visible surface-emitting lasers.
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