Publication | Closed Access
Effects of the plasma oxygen concentration on the formation of SiOxCy films by low temperature PECVD
19
Citations
7
References
2004
Year
Materials ScienceMaterials EngineeringPlasma Oxygen ConcentrationEngineeringSioxcy FilmsSurface ScienceApplied PhysicsChemical Vapor DepositionThin FilmsChemical DepositionLow Temperature PecvdPlasma ProcessingThin Film Processing
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