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Processing and evaluation of metal gate/high-κ/Si capacitors incorporating Al, Ni, TiN, and Mo as metal gate, and ZrO2 and HfO2 as high-κ dielectric

Materials ScienceMaterials EngineeringElectrical EngineeringMetal GateEngineeringSemiconductor TechnologyOxide ElectronicsSemiconductor Device FabricationHigh-κ DielectricMicroelectronicsMetal Gate/high-κ/si CapacitorsSemiconductor Device