Thermal crystallization of amorphous Si/SiO2 superlattices

Abstract

Annealing of amorphous Si/SiO2 superlattices produces Si nanocrystals. The crystallization has been studied by transmission electron microscopy and x-ray analysis. For a Si layer thinner than 7 nm, nearly perfect nanocrystals are found. For thicker layers, growth faults and dislocations exist. Decreasing the a-Si layer thickness increases the inhomogeneous strain by one order of magnitude. The origin of the strain in the crystallized structure is discussed. The crystallization temperature increases rapidly with decreasing a-Si layer thickness. An empirical model that takes into account the Si layer thickness, the Si/SiO2 interface range, and a material specific constant has been developed.