Effect of aluminum plasma parameters on the physical properties of Ti-Al-N thin films deposited by reactive crossed beam pulsed laser deposition - Concepedia

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Effect of aluminum plasma parameters on the physical properties of Ti-Al-N thin films deposited by reactive crossed beam pulsed laser deposition

12

Citations

10

References

2013

Year

L. Escobar‐Alarcón, Dora Alicia Solís-Casados, S. Romero, M. Fernández, J. Pérez‐Álvarez, E. Haro‐Poniatowski

Applied Surface Science

Materials ScienceAluminum Plasma ParametersAluminium NitrideEngineeringApplied PhysicsTi-al-n Thin FilmsLaser-assisted DepositionThin FilmsPulsed Laser DepositionThin Film ProcessingPhysical Properties

References

	Year	Citations

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