Effect of rf power on the growth of silicon nanowires by hot-wire assisted plasma enhanced chemical vapor deposition (HW-PECVD) technique - Concepedia

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Effect of rf power on the growth of silicon nanowires by hot-wire assisted plasma enhanced chemical vapor deposition (HW-PECVD) technique

19

Citations

20

References

2011

Year

Su Kong Chong, Boon Tong Goh, Zarina Aspanut, Muhamad Rasat Muhamad, Chang Fu Dee, Saadah Abdul Rahman

Thin Solid Films

Materials ScienceSilicon NanowiresEngineeringNanotechnologyApplied PhysicsSemiconductor Device FabricationChemical Vapor DepositionRf PowerPlasma ProcessingSilicon On InsulatorElectrical Insulation

References

	Year	Citations

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