Synthesis of Diamond Thin Films by Thermal CVD Using Organic Compounds

Abstract

Diamond thin films have been formed by thermal chemical vapor deposition (thermal CVD) using the organic compounds such as CH 3 OH, C 2 H 5 OH, CH 3 COCH 3 C 2 H 5 OC 2 H 5 , and (CH 3 ) 3 N. The films are grown on the silicon substrates with high growth rate (8–10 µm/h) under the pressure ranging 1–800 Torr. This growth rate is ten or several ten times faster than the CVD method using hydrocarbons such as CH 4 and C 2 H 2 . The films have good crystallinity and high quality in the sense of electron diffraction and Raman spectrum. The Vicker's hardness of the film is about 10000 kg/mm 2 and the gravity of that is about 3.52 g/cm 3 .