Electrical Overstress/Electrostatic Discharge Symposium · 2006 · 25 citations · 6 references
EngineeringElectrical EngineeringMicroelectronicsPower ElectronicsSemiconductor DevicesCmos Circuit DesignComplementary Metal-oxide-semiconductor TechnologyIntegrated Circuit DesignBallastGate Oxide InterfacesGate OxidesLow-voltage Cmos DesignProtectionProtection CircuitsReduction Of AreaSnapback Device Protection
This paper presents an ESD protection design scheme for mixed-power domains in narrow ESD design window with ultra-thin gate oxides. Using a grounded gate (gg)NMOS-based clamp with contact ballast (CTB) layout technique, a factor of 3X area reduction can be achieved for MM protection of a 1.6 nm gate oxide compared to a conventional silicide-block ESD scheme. To expand the design window, a novel ground current trigger (GCT) technique using current sensing circuit between different GND busses is proposed. 7 kV HBM and 550 V MM can be achieved with a 2nd clamp with GCT technique, with the same area as a conventional snapback protection device. The GCT technique is also effective for SCR trigger element as cross clamp.
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Gianluca Boselli, J. Antonio Travieso-Rodríguez, C. Duvvury et al. · Electrical Overstress/Electrostatic Discharge Symposium · 2005 · 38 citations
Engineering, Computer Engineering, Electrical Engineering +17
Gate dielectric breakdown: A focus on ESD protection
B. E. Weir, Che-Choi Leung, P. J. Silvėrman et al. · 2004 · 24 citations
Engineering, Computer Engineering, Electrical Engineering +16