Applied Physics Letters · 1998 · 213 citations · 9 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor MaterialsSurface ScienceMetal-semiconductor ContactsSemiconductor Device MaterialsSemiconductor InterfacesSemiconductor SurfacesSurface PassivationSurface PhysicsContact ResistanceElectrical Contact ResistanceEpitaxial Film GrowthGallium Nitride (Gan) MaterialsOhmic ContactsResistivityResistivity MeasurementSemiconductor Surface Preparation
Ohmic contact to p-type GaN with the lowest contact resistivity was developed by the surface treatment prior to Pd/Au metal deposition. The contact resistivity drastically decreased from 2.9×10−2 to 4.3×10−4 Ω cm2 by the surface treatment using aqua regia. The surface treatment plays a role in removing the surface oxide formed on p-type GaN during epitaxial growth, and subsequently in reducing the barrier height for holes at the interface of Pd/p-type GaN, resulting in the good ohmic contacts to p-type GaN.
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Handbook of X-Ray Photoelectron Spectroscopy
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Very low resistance multilayer Ohmic contact to <i>n</i>-GaN
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Low resistance ohmic contacts on wide band-gap GaN
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