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Damage threshold influenced by the high absorption defect at the film–substrate interface under ultraviolet laser irradiation
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Citations
20
References
2013
Year
EngineeringLaser ApplicationsDamage ThresholdLaser OpticsOptical PropertiesHigh Absorption DefectPulsed Laser DepositionLaser-induced Damage ThresholdMaterials ScienceUltraviolet Laser IrradiationPhysicsHigh ReflectivityLaser Processing TechnologyLaser-assisted DepositionDepth-graded Multilayer CoatingAdvanced Laser ProcessingLaser-induced BreakdownSurface ScienceApplied PhysicsThin FilmsLaser-surface InteractionsOptoelectronicsLaser Damage
The laser-induced damage threshold (LIDT) of a single-layer coating at the nanosecond (ns) regime is obviously lower than an uncoated substrate or a high reflectivity coating coated by the same material. To elucidate this phenomenon, we demonstrate the LIDT of three types of samples at 355 nm with 8 ns. High absorption defects are found at the film-substrate interface by comparing their LIDTs and damage morphologies. These defects originate from the substrate and appear during the coating process. Simulation results show that these defects, coupled to the coating, are mainly responsible for decreasing the damage threshold.
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