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Characterization of potassium tantalum niobate films formed by metalorganic deposition
29
Citations
25
References
1992
Year
Materials ScienceMaterials EngineeringChemical EngineeringMetalorganic DepositionPotassium Tantalum NiobateEngineeringFerroelectric ApplicationCorrosionOxide ElectronicsSurface ScienceApplied PhysicsElectric FieldThin FilmsChemical DepositionElectrical PropertyChemical Vapor DepositionThin Film ProcessingElectrochemistry
Thin films of potassium tantalum niobate, KTa0.6Nb0.4O3, with a Curie temperature of 20 °C were deposited on a variety of substrates by metalorganic deposition. These films had peak relative permittivities of 16 000 at 20 °C. Hysteresis plots of electric displacement as a function of electric field, taken at 0 °C, revealed a coercive field of 800 V/cm, a spontaneous polarization of 3.9 μC/cm2, and a remnant polarization of 0.5 μC/cm2. The hysteresis loops did not change significantly as the temperature was varied down to −100 °C.
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