Characterization of potassium tantalum niobate films formed by metalorganic deposition

J. V. Mantese, Adolph L. Micheli, Norman W. Schubring, Antonio B. Catalan, Yen‐Lung Chen, Richard A. Waldo, Curtis A. Wong

Journal of Applied Physics · 1992 · 29 citations · 25 references

Concepts

Abstract

Thin films of potassium tantalum niobate, KTa0.6Nb0.4O3, with a Curie temperature of 20 °C were deposited on a variety of substrates by metalorganic deposition. These films had peak relative permittivities of 16 000 at 20 °C. Hysteresis plots of electric displacement as a function of electric field, taken at 0 °C, revealed a coercive field of 800 V/cm, a spontaneous polarization of 3.9 μC/cm2, and a remnant polarization of 0.5 μC/cm2. The hysteresis loops did not change significantly as the temperature was varied down to −100 °C.

References

25