Low level plasma formation in a carbon velvet cesium iodide coated cathode

Abstract

Field emission cathodes have been a subject of research for many years. These cathodes hold the promise of effective electron emission in the absence of a heater. Such devices find application in the high power microwave (HPM) arena, as well as the conventional microwave industry and other areas such as flat panel displays. Over the past several years the Air Force Research Laboratory began to focus on cesium iodide cathodes as a field emission cathode of some interest. Previously reported results demonstrated a cesium iodide coated carbon velvet cathode capable of over one million pulses of operation with no degradation of emission. However, the exact emission mechanism remains somewhat unclear. This paper presents results showing that plasma formation on the cathode surface remains minimal at 1 μs pulse lengths. While ionized cesium and iodine lines exist in the light spectrum from the diode, these lines remain quite small, with the fluorescent emission from solid cesium iodide dominating the optical spectra in the diode. Hence, we propose that the cesium iodide coated carbon velvet operates in a space charge limited regime with pure field emission alone.