Journal of Applied Physics · 1999 · 10 citations · 4 references
Natural SciencesMaterials EngineeringMaterials ScienceCrystal StructureMagnetic MaterialsThin FilmsFerromagnetic MaterialsFerromagnetismMagnetic Properties Of SolidsMagnetism In SolidsThin Film Magnetic PropertiesThin-film MaterialsAmorphous StructureGrain StructureMagnetic PropertiesMagnetron SputteringResistivitySoft Ferromagnetic MaterialsSoft Magnetic Thin FilmsSputtering
FeTaN films with moderate Bs of 14 kG and high resistivity of 100–150 μΩ cm have been investigated. Even with a low Ta incorporation of only 3 at. %, films with the above characteristics were obtained by using rf diode and dc magnetron sputtering. When the soft magnetic properties were optimized, only a body-centered-cubic α-Fe phase was found, and it had a significantly expanded crystal lattice. The films exhibited a nearly amorphous grain structure. It was found that low atomic mobility of the sputtered atoms was needed in order to promote formation of this phase.
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