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Mesoscopic Patterning in Thin Polymer Films Formed under the Fast Dip‐Coating Process
59
Citations
27
References
2005
Year
EngineeringMolecular Self-assemblyDip‐coating ProcessSurface NanotechnologyThin Film Process TechnologyPolymersMaterials FabricationSelf‐assembled PolystyreneMesoscopic PatterningPolymer ProcessingThin Film ProcessingMaterials ScienceSurface ModificationFast Dip‐coating ProcessInterfacial PhenomenonSelf-assemblySurface ScienceApplied PhysicsPolymer ScienceMarangoni InstabilityThin FilmsPolymer Self-assemblySurface Processing
Abstract Summary: Mesoscopically ordered self‐assembled polystyrene, polycarbonate and poly(methyl methacrylate) films were obtained when polymer solutions were deposited on vertical plates and dried with hot air. It was shown that characteristic size (≈50 μm) of the mesoscopic cell is practically insensitive to the polymer or substrate kind, while the thickness of the substrate plays a decisive role in the mesoscopic patterning. Junction angles of 120 and 90° were observed. Marangoni instability plays an important role in the cell's structure formation. A semi‐quantitative model explaining the phenomenon of mesoscopic cell formation is proposed. Scheme of the dip‐coating process. image Scheme of the dip‐coating process.
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