ESDIAD studies of fluorine and chlorine adsorption at Si(100)

Structural and electronic model of negative electron affinity on the Si/Cs/O surface

Jules D. Levine · Surface Science · 1973 · 392 citations

Materials Science, Si/cs/o Surface, Surface Characterization +10

Synchrotron photoemission investigation of the initial stages of fluorine attack on Si surfaces: Relative abundance of fluorosilyl species

F. R. McFeely, J. F. Morar, N. D. Shinn et al. · Physical review. B, Condensed matter · 1984 · 205 citations

Engineering, Chemistry, Fluorine Attack +16

A simple, controllable source for dosing molecular halogens in UHV

Nicholas D. Spencer, P.J. Goddard, P. W. Davies et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1983 · 155 citations

Materials Science, Chemical Engineering, Engineering +15

Chlorine chemisorption on silicon and germanium surfaces: Photoemission polarization effects with synchrotron radiation

J. E. Rowe, G. Margaritondo, S. B. Christman · Physical review. B, Solid state · 1977 · 124 citations · Full text

Engineering, Chemistry, Germanium Surfaces +17

Electronic properties and bonding sites for chlorine chemisorption on Si(111)-(7×7)

R.D. Schnell, D. Rieger, A. Bogen et al. · Physical review. B, Condensed matter · 1985 · 118 citations

Engineering, Inorganic Photochemistry, Chemistry +17