Photosensitive systems for microlithography based on organometallic photoinitiators

Jürgen Finter, Martin Riediker, Bruno Rotzinger, Ottmar Rohde

Makromolekulare Chemie Macromolecular Symposia · 1989 · 26 citations · 13 references

Concepts

Abstract

Abstract The photodecomposition of the Ar‐laser sensitive photo‐initiator bis(pentafluorophenyl)titanocene 1 was investigated. Two intermediate species were postulated: a pentafluorophenylcyclopentenyl radical 16 which acts as quencher and a ketene acetal radical of the structure CH 2 ‐CH=C(OCH 3 )OTiR x 17 which could initiate the polymerization.

References

13