Publication | Closed Access
Growth of high quality silicon carbide films on Si by triode plasma CVD using monomethylsilane
40
Citations
4
References
2001
Year
Materials ScienceEngineeringSurface ScienceApplied PhysicsSemiconductor Device FabricationSilicon On InsulatorPlasma ProcessingTriode Plasma CvdChemical Vapor DepositionCarbide
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