Description of Transfer and Deposition during PLD of Thin Ceramic Films.

M. Alunovic, E.W. Kreutz, A. Voss, Mirko Aden, H. Sung

ISIJ International · 1994 · 10 citations · 1 references

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Abstract

Thin films of ceramic materials (Al203' Zr02) for technical applications are deposited at different laser parameters (wavelength, fluence, mode of operation) and processing variables (processing gas pressure and composition, rf bias, distance target-substrate).

References

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