Epitaxial growth of zinc-blende CrAs/GaAs multilayer

Abstract

Zinc-blende CrAs/GaAs multilayers were grown by molecular beam epitaxy. It was certified that each CrAs layer maintains an epitaxial relationship with the zinc-blende GaAs structure judging from the reflection high-energy electron diffraction observation. The film contains thicker zinc- blende CrAs layers in total than the CrAs thin film directly grown on the GaAs substrate which has the critical thickness of 3 nm. It was clarified that the optimum thicknesses of CrAs and GaAs to keep a good epitaxial relationship are 2 ML and 2 ML, respectively. The electronic structure of the multilayer is thought to be close to that of the (Ga, Cr)As thin film which has 50% of Cr content judging from x-ray absorption spectroscopy measurements.