Chemical vapour deposition growth of graphene layers on metal substrates

Abstract

Graphene layers were grown by chemical vapour deposition (CVD) on Si wafers covered by a SiO2 substrate layer and a Ni interlayer, and on copper and nickel foil. The obtained graphene layers were characterized by Raman spectroscopy. The films grown on SiO2/Ni substrate and Ni foil comprise mainly multilayer defect-rich graphene, while those on Cu foil exhibit the spectroscopic fingerprint of relatively defect-free single-layer graphene due to the low carbon solubility in copper and the suitably chosen substrate position in a quasiclosed volume. Optimal growth conditions and the nature of defects in the layers are discussed.