Applied Optics · 1985 · 144 citations · 15 references
Natural SciencesMaterials EngineeringMaterials ScienceSurface EngineeringSurface ScienceThin FilmsSurface PhysicsThin Film Optical PropertiesThin-film DepositionThin-film MaterialsCurrent DensityElectron Beam EvaporationExtinction Coefficient MeasurementsFilm Growth MechanismsScattering LossThin Oxide FilmsThin Oxide LayersThin-film Oxides
Thin films have been prepared by electron-beam evaporation of CeO2, where the growing film has been bombarded with oxygen ions. The packing density of the films has been increased from ∼0.55 without ion bombardment to unity with bombardment as determined by moisture adsorption measurements. The refractive index, extinction coefficient, and scattering loss are reported for a range of ion energies from 50 to 1200 eV. The ratio of ion-current density to film growth rate required to produce films that did not adsorb moisture was found to be a minimum for ion energies in the 300–600-eV range. Absorption and scatter losses are smallest for the lower ion energies and the crystal structure of CeO2 films is relatively stable under ion bombardment although ion-assisted films tend to be less crystalline than evaporated layers.
15
Ion-beam-assisted deposition of thin films
Peter Martin, H. A. Macleod, R. P. Netterfield et al. · Applied Optics · 1983 · 281 citations
Natural Sciences, Materials Engineering, Materials Science +16
J. M. E. Harper, J. J. Cuomo, P. Leary et al. · Journal of The Electrochemical Society · 1981 · 113 citations · Full text