Electronics Letters · 1982 · 43 citations · 13 references
EngineeringMaterials EngineeringMaterials ScienceOptoelectronicsSemiconductor DevicesSemiconductor MaterialsLaser PhysicsOptical Properties Of SemiconductorsQuantum WellsSemiconductor Device MaterialsSemiconductor LasersSemiconductor PhysicsFacet CoatingsLasersLow-threshold Current LasersQuantum Well GrowthQuantum Well Growth TechniquesQuantum Well LasersQuantum Well StructuresSemiconductor Laser Fabrication
The letter reports low-threshold MO-CVD GaAlAs DH (∼7730 Å) lasers containing Mg as the p-type dopant. The structure consists of symmetric stepped index cladding layers on both sides of a thin single quantum well (∼60 Å) active region. Broad-area threshold current densities of 460 A cm−2 and 270 A cm−2 are achieved for cavity lengths of 250 and 500 μm, respectively. Broad-area room-temperature lasers without facet coatings emit in excess of 400 mW/facet CW output power.
13
Disorder of an AlAs-GaAs superlattice by impurity diffusion
W. D. Laidig, N. Holonyak, M. D. Camras et al. · Applied Physics Letters · 1981 · 599 citations
Quantum-well heterostructure lasers
N. Holonyak, R. M. Kolbas, Russell D. Dupuis et al. · IEEE Journal of Quantum Electronics · 1980 · 545 citations