Publication | Open Access
Tracing the two- to three-dimensional transition in the InAs/GaAs(001) heteroepitaxial growth
75
Citations
37
References
2003
Year
Critical ThicknessEngineeringHeteroepitaxial GrowthSemiconductor NanostructuresIi-vi SemiconductorQuantum MaterialsMolecular Beam EpitaxyNanoscale ScienceEpitaxial GrowthCompound SemiconductorMaterials SciencePhysicsNanotechnologyStructural FeaturesSurface ScienceApplied PhysicsCondensed Matter PhysicsThree-dimensional TransitionStrained Phase
We have investigated by atomic force microscopy and scanning tunneling microscopy subsequent stages of the heteroepitaxy of InAs on GaAs(001) from the initial formation of the strained two-dimensional wetting layer up to the development of three-dimensional quantum dots. We provide evidence of structural features that play a crucial role in the two- to three-dimensional transition and discuss their contribution to the final morphology of the self-assembled nanoparticles. A model is suggested for the strained phase at the critical thickness consisting of an intermixed ${\mathrm{In}}_{x}{\mathrm{Ga}}_{1\ensuremath{-}x}\mathrm{As}$ surface layer of composition $x=0.82$ and InAs ``floating'' on top. Such ``floating'' phase participate to the large mass transport along the surface during the two- to three-dimensional transition that accounts quantitatively for the total volume of dots.
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