Characteristics of surface-wave plasma with air-simulated N<sub>2</sub>–O<sub>2</sub>gas mixture for low-temperature sterilization

Lei Xu, H Nonaka, Huayi Zhou, Akihisa Ogino, Toshi Nagata, Yukio Koide, S Nanko, I Kurawaki, Masaaki Nagatsu

Journal of Physics D Applied Physics · 2007 · 36 citations · 16 references

Concepts

Abstract

Sterilization experiments using low-pressure air discharge plasma sustained by the 2.45 GHz surface-wave have been carried out. Geobacillus stearothermoplilus spores having a population of 3.0 × 106 were sterilized for only 3 min using air-simulated N2–O2 mixture gas discharge plasma, faster than the cases of pure O2 or pure N2 discharge plasmas. From the SEM analysis of plasma-irradiated spores and optical emission spectroscopy measurements of the plasmas, it has been found that the possible sterilization mechanisms of air-simulated plasma are the chemical etching effect due to the oxygen radicals and UV emission from the N2 molecules and NO radicals in the wavelength range 200–400 nm. Experiment suggested that UV emission in the wavelength range less than 200 nm might not be significant in the sterilization. The UV intensity at 237.0 nm originated from the NO γ system (A 2Σ+ → X 2Π) in N2–O2 plasma as a function of the O2 percentage added to N2–O2 mixture gas has been investigated. It achieved its maximum value when the O2 percentage was roughly 10–20%. This result suggests that air can be used as a discharge gas for sterilization, and indeed we have confirmed a rapid sterilization with the actual air discharge at a sample temperature of less than 65 °C.

References

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