Concepedia

Superhard tantalum-nitride films formed by inductively coupled plasma-assisted sputtering

G.R. Lee, H. Kim, Howook Choi, J.J. Lee

Surface and Coatings Technology · 2006 · 43 citations · 16 references

DOI

Concepts

References

16

An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments

W. C. Oliver, George M. Pharr · Journal of materials research/Pratt's guide to venture capital sources · 1992 · 26.6K citations

, , +16

Effects of Nitrogen, Methane, and Oxygen on Structure and Electrical Properties of Thin Tantalum Films

D. Gerstenberg, C. J. Calbick · Journal of Applied Physics · 1964 · 179 citations

, , +16

Structure of Tantalum Nitrides

Nobuzo Terao · Japanese Journal of Applied Physics · 1971 · 175 citations

, , +12

Comparison of the diffusion barrier properties of chemical-vapor-deposited TaN and sputtered TaN between Cu and Si

Mei‐Hui Tsai, Shuo Sun, C.E. Tsai et al. · Journal of Applied Physics · 1996 · 174 citations

, , +17

Properties of reactively sputter-deposited TaN thin films

Xin Sun, Elzbieta Kolawa, Jen‐Sue Chen et al. · Thin Solid Films · 1993 · 135 citations

, , +11