Microstrip resonator using sputtered Y₁Ba₂Cu₃O_{7- delta}film on (100) MgO

Abstract

The design, development and measurement of an X-band microstrip resonator fabricated using a sputtered Y1Ba2Cu3O7- delta thin film are presented. The films were grown in situ at 700 degrees C in a hollow cylindrical magnetron sputtering system. The resonator is a capacitive-gap coupled two-port transmission-type resonator in a microstrip configuration. The measurements were carried out in the temperature range 30 K to 300 K using a closed cycle He cryocooler. The resonator patterns on the sputtered Y1Ba2Cu3O7- delta film were generated using conventional photolithography and wet-etch process. Microwave surface resistance values obtained for the above resonator are compared with those of conventional gold resonators.