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Room temperature MBE deposition of Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> thin films with low charge carrier densities
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Citations
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References
2011
Year
Materials ScienceThin Film PhysicsEngineeringCrystalline DefectsOxide ElectronicsAbstract Sb 2Surface ScienceApplied PhysicsCondensed Matter PhysicsSemiconductor MaterialThin Film Process TechnologySb 2Thin FilmsChemical DepositionEpitaxial GrowthChemical Vapor DepositionThin Film ProcessingThin-film Technology
Abstract Sb 2 Te 3 and Bi 2 Te 3 thin films were grown at room temperature on SiO 2 substrates using MBE and were subsequently annealed at 250 °C. The films were stoichiometric, polycrystalline, textured, and yielded strikingly low charge carrier densities of about 2.7 × 10 19 cm −3 . The in‐plane transport properties were measured at room temperature, the thermopower was 130 µV K −1 for Sb 2 Te 3 and −153 µV K −1 for Bi 2 Te 3 thin films. The small charge carrier densities are explained by a reduced antisite defect density due to the low temperatures to which the thin films were exposed during annealing.
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