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Spray pyrolysis deposition of thin films
51
Citations
9
References
1996
Year
Materials ScienceMaterials EngineeringChemical EngineeringOptical MaterialsEngineeringOptical PropertiesOptical GlassSurface ScienceTin ChlorideThin Film Process TechnologyChemistryThin FilmsChemical DepositionPyrex Glass SubstratesChemical Vapor DepositionThin Film ProcessingAbsorption Coefficient
Ternary compound thin films have been prepared on Pyrex glass substrates by the spray pyrolysis process using tin chloride and n, n-dimethylthiourea as starting materials. The depositions were carried out at a substrate temperature of . The identification of the phase was achieved by means of x-ray diffraction measurements. The optical reflectance and transmittance of the prepared films were used to obtain the variation of the refractive index and the extinction coefficient as a function of the wavelength. These calculated values were used to find the absorption coefficient and the optical bandgap and gave . From measurements of the conductance as a function of , a dark activation energy was determined with a value of 1.02 eV.
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