Self-consistent simulation of pulsed and continuous microwave discharges in hydrogen

Abstract

Results are presented from numerical simulations of pulse-periodic and continuous microwave discharges in hydrogen that are used in CVD reactors for chemical vapor deposition of diamond films. Attention is focused on the processes that should be taken into account in order to construct the simplest possible adequate numerical model. It is shown that the processes of vibrational excitation of hydrogen molecules, as well as chemical reactions, play an important role in the establishment of energy balance within the discharges. The results of numerical simulations are compared to the experimental data.