Journal of Applied Physics · 1968 · 31 citations · 4 references
EngineeringMixed ChromiumThin Film Process TechnologyChemical DepositionVarious Deposition ParametersIr ReflectanceThin Film ProcessingMaterials EngineeringMaterials ScienceElectrical EngineeringStructural PropertiesOxide ElectronicsSemiconductor MaterialElectrical InsulationMicroelectronicsElectrical PropertySilicon Monoxide FilmsSurface ScienceApplied PhysicsThin FilmsChemical Vapor DepositionSilicon Monoxide
Films containing a mixture of chromium and silicon monoxide were prepared on glass substrates by vacuum deposition. The significance of various deposition parameters was determined. The films were examined by x-ray diffraction, electron microscopy, and ir reflectance and transmission. The electrical conductivity was measured as a function of temperature and applied electrical field. A relationship between film structure and electrical conductivity was found for film compositions which were almost metallic to almost insulating.
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