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Experimental studies of misfit dependence of critical layer thickness in pseudomorphic InGaAs single-strained quantum-well structures
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Citations
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References
1989
Year
EngineeringMechanical Equilibrium ModelOptoelectronic DevicesSemiconductor NanostructuresSemiconductorsQuantum MaterialsMolecular Beam EpitaxyEpitaxial GrowthCompound SemiconductorMaterials ScienceQuantum SciencePhysicsCrystalline DefectsQuantum DevicePhotoluminescence SpectroscopyCritical Layer ThicknessApplied PhysicsCondensed Matter PhysicsMisfit DependenceExperimental StudiesOptoelectronics
The dependence of critical layer thickness on a misfit in pseudomorphic GaAs/InGaAs/GaAs single quantum-well structures grown by molecular-beam epitaxy is studied using a phase-contrast optical microscope and photoluminescence spectroscopy. The results show that the critical layer thickness as a function of misfit follows more closely with Matthews and Blakeslee’s mechanical equilibrium model [J. Cryst. Growth 27, 118 (1974)] than People and Bean’s energy balance model [Appl. Phys. Lett. 49, 229 (1986)]. However, the observed critical layer thickness is slightly less than that predicted by the mechanical equilibrium model for single quantum-well structures.
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