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<i>In situ</i> studies of the crystallization kinetics in Sb–Ge films
37
Citations
16
References
1995
Year
Optical MaterialsEngineeringCrystal Growth TechnologyEpitaxial GrowthCrystal FormationThin Film ProcessingMaterials ScienceMaterials EngineeringPhysicsCrystal MaterialSitu AnnealingSbxge1−x Alloy FilmsCrystallographyMaterial AnalysisSurface ScienceApplied PhysicsCondensed Matter PhysicsSb–ge FilmsThin FilmsAmorphous Solid
The crystallization process in SbxGe1−x alloy films has been observed during in situ annealing in a transmission electron microscope. Results are presented for two films with x=0.89 (89 at. % Sb) and x=0.71 (71 at. % Sb), which lie on either side of the eutectic composition (x=0.85). In the former films radial crystals are observed to grow rapidly from discrete nuclei, whereas in the latter films the crystallization process occurs through a near-planar front. In addition, quantitative data obtained from these experiments show that the Sb0.89Ge0.11 films have a higher activation energy for crystal growth and a lower temperature for the nucleation of crystals. Significant differences are observed between the crystallization processes for the two films studied, with the Sb0.89Ge0.11 film showing better potential for development as an ultrafast optical phase-change storage medium.
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