Publication | Closed Access

Phosphorous and boron doping of nc-Si:H thin films deposited on plastic substrates at 150 °C by Hot-Wire Chemical Vapor Deposition

Materials ScienceElectronic DevicesEngineeringPlastic SubstratesSurface ScienceApplied PhysicsSemiconductor MaterialOptoelectronic DevicesThin Film Process TechnologyThin FilmsH Thin FilmsChemical Vapor DepositionThin Film ProcessingBoron Doping