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Low-loss optical channel waveguides in KNbO3 by multiple energy ion implantation
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Citations
17
References
1992
Year
PhotonicsSingle CrystalsOptical MaterialsEngineeringIon ImplantationPhysicsLow-dose MevOptical PropertiesOptical Transmission SystemApplied PhysicsLaser ApplicationsGuided-wave OpticSingle Energy ImplantationIon BeamOptical CommunicationOptoelectronicsElectro-optics DeviceBeam Optic
Permanent optical channel waveguides in single crystals of KNbO3 are formed with low-dose MeV He ion irradiation. A single energy implantation forms a confinement barrier at the projected range of the ions whereas multiple energy implantations combined with a positive shielding mask form the side walls. Guiding modes are produced and propagation losses as low as 1.0 dB/cm are measured without the need for any annealing. The irradiation induced refractive index changes that define the boundaries of the waveguiding channels are made visible with cross-polarized light microscopy.
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