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Radiochemical Studies of Thiourea in the Electroless Deposition Process
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1963
Year
Materials ScienceNickel DepositionRadiochemical StudiesEngineeringKinetics StudiesSurface ScienceCatalysisChemistryChemical DepositionDesulfurizationCatalytic ProcessThiourea ConcentrationElectrode Reaction MechanismElectrochemistryElectrochemical Surface Science
The effect of thiourea on the electroless nickel deposition reaction has been studied by the use of sulfur‐35 and carbon‐14 labeled thiourea. The amount of sulfur in the deposit was found to be much greater than the amount of carbon, thereby indicating cleavage. The effect of thiourea on the rate of nickel deposition has been shown to be due to two different mechanisms depending on the thiourea concentration. It is proposed that the catalytic substrate acts as a Raney nickel‐type surface. Kinetics studies have been carried out correlating the rate of sulfur inclusion in the deposit with rate of nickel deposition. Mechanisms have been postulated to explain the observed results.