Publication | Closed Access
Chemical vapor deposition of Al2O3 films using highly volatile single sources
50
Citations
10
References
1997
Year
Materials ScienceMaterials EngineeringChemical EngineeringAluminium NitrideEngineeringVolatile Single SourcesSurface ScienceApplied PhysicsAl2o3 FilmsThin Film Process TechnologyThin FilmsChemical DepositionChemical Vapor DepositionChemical VaporThin Film Processing
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