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Normal incidence reflectance of ion beam deposited SiC films in the EUV
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1988
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Electrical EngineeringOptical MaterialsEngineeringIon ImplantationOptical PropertiesReddit ShareApplied PhysicsBibliometricsSic FilmsIon BeamNormal Incidence ReflectanceCitation AnalysisTechnologyIon EmissionOptoelectronicsJournalismDepth-graded Multilayer Coating
Get PDF Email Share Share with Facebook Tweet This Post on reddit Share with LinkedIn Add to CiteULike Add to Mendeley Add to BibSonomy Get Citation Copy Citation Text Ritva A. M. Keski-Kuha, John F. Osantowski, Howard Herzig, Jeffrey S. Gum, and Albert R. Toft, "Normal incidence reflectance of ion beam deposited SiC films in the EUV," Appl. Opt. 27, 2815-2816 (1988) Export Citation BibTex Endnote (RIS) HTML Plain Text Citation alert Save article
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