Publication | Open Access
Weak localization in InSb thin films heavily doped with lead
13
Citations
19
References
2002
Year
Materials ScienceEpitaxial GrowthEngineeringCrystalline DefectsPhysicsIntrinsic ImpurityApplied PhysicsCondensed Matter PhysicsInsb FilmsWeak LocalizationSemiconductor MaterialThin FilmsWl TheorySolid-state PhysicThin Film ProcessingMagnetoresistance
We study the weak localization (WL) in three-dimensional polycrystalline thin films of InSb. The films are closely compensated showing the electron concentration $n>{10}^{16} {\mathrm{cm}}^{\ensuremath{-}3}$ at the total concentration of the donor- and acceptor-type structural defects ${N}_{t}>{10}^{18} {\mathrm{cm}}^{\ensuremath{-}3}.$ Unless Pb doped, the InSb films do not show any measurable or show very small WL effect at 4.2 K. The Pb doping to the concentration of the order of ${10}^{18} {\mathrm{cm}}^{\ensuremath{-}3}$ leads to pronounced WL effects below 7 K. From the comparison of the experimental data on temperature dependence of the magnetoresistivity and sample resistance with the WL theory, the dependence of the phase destroying time ${\ensuremath{\tau}}_{\ensuremath{\varphi}}(T)$ is determined. It is concluded that the dephasing is connected to three separate processes. The first is due to the spin-orbit scatterings and is characterized by temperature-independent relaxation time ${\ensuremath{\tau}}_{\mathrm{so}}\ensuremath{\simeq}{10}^{\ensuremath{-}12} \mathrm{s}.$ The second is associated with the electron-phonon interaction $({\ensuremath{\tau}}_{i}\ensuremath{\sim}{T}^{\ensuremath{-}3}).$ The third dephasing process is characterized by temperature-independent relaxation time ${\ensuremath{\tau}}_{c}=(1--7)\ifmmode\times\else\texttimes\fi{}{10}^{\ensuremath{-}12} \mathrm{s},$ which is tentatively ascribed to inelastic scattering at extended structural defects. The resulting time ${\ensuremath{\tau}}_{\ensuremath{\varphi}}$ shows saturation in its temperature dependence for $\stackrel{\ensuremath{\rightarrow}}{T}0.$ The temperature dependence of the resistance can be explained by the electron-electron interaction for $T<1 \mathrm{K},$ and by the WL effect for $T>2 \mathrm{K}.$
| Year | Citations | |
|---|---|---|
Page 1
Page 1