Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol‐ene Click Chemistry

Abstract

As easy as “shake and bake”, the mixing and photocuring of poly-functional thiols with alkene-functional cross-linkers, via thiol-ene click chemistry, leads to materials with outstanding and tunable characteristics for soft imprint lithography. The materials are cured within 2 minutes at ambient conditions allowing stamps with high aspect ratio and sub-100 nm features to be fabricated.