Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol‐ene Click Chemistry

L. M. B. C. Campos, Ines Meinel, Rosette G. Guino, Martin Schierhorn, Nalini Gupta, Galen D. Stucky, Craig J. Hawker

Advanced Materials · 2008 · 205 citations · 26 references

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Concepts

Abstract

As easy as “shake and bake”, the mixing and photocuring of poly-functional thiols with alkene-functional cross-linkers, via thiol-ene click chemistry, leads to materials with outstanding and tunable characteristics for soft imprint lithography. The materials are cured within 2 minutes at ambient conditions allowing stamps with high aspect ratio and sub-100 nm features to be fabricated.

References

26