Reactions of XeF2 chemisorbed on Si(111) 7×7

Abstract

The stable overlayer composition resulting from dissociative chemisorption of XeF2 on the Si(111)7×7 surface has been studied by x-ray photoelectron spectroscopy and thermal desorption spectrometry. Evidence is found for the existence of fluorine covalently bonded in the bulk; no evidence for unreacted interstitial fluorine is found.