The Influence of Electrophoretic Deposition for Fabricating Dye‐Sensitized Solar Cell

Abstract

Titanium dioxide (TiO 2 ) film was deposited on fluorine‐doped tin oxide (FTO) glass substrate by electrophoretic deposition method (EPD). TiO 2 films were prepared with different I 2 dosages, electric field intensities and deposition time (D.T.), electrophotic deposition times. By different I 2 dosages, electric field intensities, deposition time, electrophotic deposition times fabricated TiO 2 films and compared photoelectric characteristics of TiO 2 films to find optimal parameters which were the highest photovoltaic conversion efficiency. And use electrochemical impedance spectroscopy (EIS) to measure the Nyquist plots under different conditions and analyze the impendence of dye‐sensitized solar cells at the internal heterojunction. According to the experimental results, the I 2 dosage was 0.025 g which obtained the optimal characteristic parameters. Thickness of TiO 2 film was 10.6 μ m, the open‐circuit voltage ( V oc ) was 0.77 V, the short‐circuit current density ( J sc ) was 7.20 mA/cm 2 , the fill factor (F.F.) was 53.41%, and photovoltaic conversion efficiency ( η ) was 2.96%.