Persistent Tris(t-butyldimethylsilyl)silyl Radical and Its New Generation Methods

Mitsuo Kira, Takeshi Obata, Itaru Kon, Hisako Hashimoto, Masaaki Ichinohe, Haruaki Sakurai, Soichiro Kyushin, Hideyuki Matsumoto

Chemistry Letters · 1998 · 42 citations · 13 references

Concepts

Abstract

Abstract A persistent silyl radical, tris(t-butyldimethylsilyl)silyl radical, (t-BuMe2Si)3Si· (1), was produced by two new methods in addition to a conventional hydrogen abstraction from the corresponding hydrosilane: one-electron oxidation of (t-BuMe2Si)3SiNa (2) by NO+BF4− and one-electron reduction of (t-BuMe2Si)3SiBr (3) by sodium.

References

13