Japanese Journal of Applied Physics · 1996 · 11 citations · 11 references
Natural SciencesMaterials EngineeringMaterials ScienceElectronic MaterialsMaterials ChemistryMaterials PhysicsInorganic SpectroscopyPhotoelectron SpectroscopySemiconductor SurfacesSilicon MaterialsSurface OxidationSurface PhysicsBand GapEnergy Band GapOxidationOxidation StatesPhotoluminescencePorous SiliconSilicon OxidationSurface States
Oxidation states of porous Si, oxidized by oxygen excited by electron impact, have been analyzed using synchrotron radiation photoemission spectroscopy (SR-PES), Auger electron spectroscopy (AES), and Fourier transform infrared (FTIR) techniques, and the relationship between the oxidation states and PL properties has been investigated. The energy band gap, peak energy and full width at half-maximum (FWHM) of the PL spectrum are almost unchanged throughout the oxidation process. These results suggest that oxygen bonding itself basically does not affect the transition levels and that its levels are less sensitive to the surface states. The results of these analyses also imply that the skeletal structure of PS crystallites is important in PL mechanisms.
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Rapid-thermal-oxidized porous Si−The superior photoluminescent Si
V. Petrova-Koch, T. Muschik, A. Kux et al. · Applied Physics Letters · 1992 · 466 citations
Natural Sciences, Materials Engineering, Materials Science +17
Static Charge Fluctuations in Amorphous Silicon
L. Ley, Juergen Reichardt, R. L. Johnson · Physical Review Letters · 1982 · 125 citations · Full text
Control of porous Si photoluminescence through dry oxidation
S. Shih, Chuen‐Jinn Tsai, K.-H. Li et al. · Applied Physics Letters · 1992 · 90 citations
Natural Sciences, Materials Engineering, Materials Science +16