Reactions of atomic nitrogen and trimethyl aluminum downstream from a nitrogen microwave plasma

Abstract

The feasibility of aluminum nitride thin-film deposition from chemical reactions of trimethyl aluminum (TMA) with active nitrogen downstream from a N2 microwave plasma has been investigated. Chemiluminescence spectra of the downstream reaction showed the presence of CN and Al and the luminescence has been proposed to result from reactions between atomic nitrogen and methyl groups of the TMA. From nitrous oxide titration measurements of the atomic nitrogen concentration, the reaction rate constant has been estimated to be k=3×10−12 cm3 s−1. Auger and infrared absorption spectroscopy measurements of a typical film indicated that AlN with carbon contamination in the form of CN had formed.