Influence of substrate bias on microstructure and morphology of ZrN thin films deposited by arc ion plating

Hardness and residual stress in nanocrystalline ZrN films: Effect of bias voltage and heat treatment

Hsiao-Ming Tung, Jia‐Hong Huang, Ding-Guey Tsai et al. · Materials Science and Engineering A · 2008 · 128 citations

Materials Engineering, Materials Science, Engineering +6

Amorphous TiO2 films with high refractive index deposited by pulsed bias arc ion plating

Min Zhang, Guoqiang Lin, Chuang Dong et al. · Surface and Coatings Technology · 2007 · 128 citations

Materials Engineering, Materials Science, High Refractive Index +9

Microstructural and electrical characteristics of reactively sputtered Ta-N thin films

Ching-Chun Chang, Jiann‐Shing Jeng, Jen‐Sue Chen · Thin Solid Films · 2002 · 116 citations

Materials Science, Surface Characterization, Material Analysis +6

Microstructural control of Cr–Si–N films by a hybrid arc ion plating and magnetron sputtering process

Qi Min Wang, Kwang Ho Kim · Acta Materialia · 2009 · 81 citations

Materials Science, Materials Engineering, Magnetron Sputtering Process +10

Property change in ZrNxOy thin films: effect of the oxygen fraction and bias voltage

F. Vaz, P. Carvalho, L. Cunha et al. · Thin Solid Films · 2004 · 74 citations · Full text

Materials Science, Material Analysis, Engineering +7