Surface Nanopatterning by Organic/Inorganic Self‐Assembly and Selective Local Functionalization

Abstract

Patterning silicon surfaces by well-ordered nanoperforated TiO(2) layers is achieved through a simple block copolymer-assisted liquid deposition technique followed by direct thermal treatment. The crater diameters are tuned between 10 and 50 nm, depending on the molecular weight of the surfactant patterning agent. The formation mechanism of such systems is discussed. The present nanopatterned heterogeneous surfaces (nanoholes with SiO(2) bottom surfaces and TiO(2) walls) are selectively functionalized with two different perfluorinated organic groups. The accessibility to the substrate surface through such nanoholes and the selective distribution of both functions on the surface is evidenced by water-contact-angle measurements, which satisfactorily verify the Cassie relationship. Such systems have wide application prospects in varied fields such as nanotechnology and engineering.