Publication | Open Access
13-μm InAs/GaAs quantum-dot lasers monolithically grown on Si substrates using InAlAs/GaAs dislocation filter layers
135
Citations
29
References
2014
Year
Semiconductor TechnologyPhotonicsEngineeringSi SubstratesIngaas/gaas SlssApplied PhysicsLaser ApplicationsIngaas/gaas Strained-layer SuperlatticesLaser MaterialSemiconductor Device FabricationGaas Buffer LayerQuantum Photonic DeviceMolecular Beam EpitaxyCategoryiii-v SemiconductorOptoelectronicsHigh-power LasersCompound SemiconductorSemiconductor Nanostructures
We compare InAlAs/GaAs and InGaAs/GaAs strained-layer superlattices (SLSs) as dislocation filter layers for 1.3-μm InAs/GaAs quantum-dot laser structures directly grown on Si substrates. InAlAs/GaAs SLSs are found to be more effective than InGaAs/GaAs SLSs in blocking the propagation of threading dislocations generated at the interface between the GaAs buffer layer and the Si substrate. Room-temperature lasing at ~1.27 μm with a threshold current density of 194 A/cm(2) and output power of ~77 mW has been demonstrated for broad-area lasers grown on Si substrates using InAlAs/GaAs dislocation filter layers.
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