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Reflectance line shapes from GaAs/Ga1−<i>x</i>Al<i>x</i>As quantum well structures
89
Citations
5
References
1988
Year
SemiconductorsQuantum ScienceReflectance Line ShapesOptical MaterialsEngineeringCategoryquantum ElectronicsPhysicsGaas/ga1−xalxas Single QuantumOptical PropertiesFront Barrier LayerOptoelectronic MaterialsApplied PhysicsPhotoluminescenceOptoelectronic DevicesReflectance ExperimentsOptoelectronicsCompound SemiconductorSemiconductor Nanostructures
Reflectance experiments on GaAs/Ga1−xAlxAs single quantum well structures were performed at 4.2 K, with different thicknesses of the front GaAlAs barrier layer (100–1000 Å). The observed exciton reflectance line shapes depend strongly on the thickness of the front barrier layer due to the interferences between the reflected waves from the front surface and the quantum well interfaces. Calculations of the reflectance line shapes show good agreement with the observations. The absorption coefficient for the electron heavy-hole exciton transition in a single quantum well sample is determined. Our study also provides a new understanding of the line shapes measured in photoreflectance experiments.
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